Search results for "Thickness measurement"
showing 4 items of 4 documents
Thickness measurement of soft thin films on periodically patterned magnetic substrates by phase difference magnetic force microscopy
2013
The need for accurate measurement of the thickness of soft thin films is continuously encouraging the development of techniques suitable for this purpose. We propose a method through which the thickness of the film is deduced from the quantitative measurement of the contrast in the phase images of the sample surface acquired by magnetic force microscopy, provided that the film is deposited on a periodically patterned magnetic substrate. The technique is demonstrated by means of magnetic substrates obtained from standard floppy disks. Colonies of Staphylococcus aureus adherent to such substrates were used to obtain soft layers with limited lateral (a levy microns) and vertical (hundreds of n…
Radzenes biezuma un acs refrakcijas korelācija bērniem.
2020
Maģistra darbs ir uzrakstīts 46 lappusēm angļu valodā. Tas satur 19 attēlus, 9 tabulas, un 62 informācijas avotus. Šī darba mērķis ir izpētīt korelāciju starp radzenes biezumu un acs refrakciju 5-12 gadus veciem bērniem. Radzenes biezuma kartes un keratometrija tika mērīta, izmantojot Scheimpflug attēl veidošanas sistēmu Schwind Sirius. Keratometrija un refrakcija tika mērīta, izmantojot autokeratorefraktotonometru Topcon TRK-2P cikloplēģijā. Katram parametram tika veikti trīs mērījumi turpmākai analīzei. Šī pētījuma nolūkos tika analizētas 196 acis. Dalībniekiem ar hipermetropiju un hipermetropo astigmātismu novēroja lielākas radzenes biezuma vērtības centrā un radzenes perifērijā, atšķirī…
Interfacial reaction during MOCVD growth revealed by in situ ARXPS.
2006
International audience; Angle-resolved X-ray photoelectron spectroscopy (ARXPS) experiments were performed to study in situ the reaction at the film–substrate interface during metal organic chemical vapor deposition (MOCVD) growth of TiO2 thin films deposited on the silicon substrate. The in-depth distribution of chemical species was determined using several ARXPS thickness calculation models considering either single or bilayer systems. By the comparison of two single-layermodels, the presence of a second layer composed of silicon oxidewas evidenced. High-resolution transmission electron microscopy (HRTEM) observations confirmed the stratification of the film in two layers, as well as the …
Angle resolved X-ray photoemission spectroscopy double layer model for in situ characterization of metal organic chemical vapour deposition nanometri…
2007
International audience; In situ Angle Resolved X-ray Photoemission Spectroscopy (ARXPS) characterizations of TiO2 thin films grown on silicon by Metal Organic Chemical Vapour Deposition were performed in order to get information on interfacial reactions at the first stages of the growth, one of the aims being to understand the influence of deposition conditions. Thickness measurements were also carried out from ARXPS analyses. As the real structure of the films was shown to be a double layer system such as TiO2/SiO2/Si, an ARXPS model of thickness and surface coverage determination was applied to each layer independently. However, the application of this model to very thin films underestima…